Atomic layer deposition of high k dielectric and metal gate stacks for MOS devices

AIP Conference Proceedings

Volumn 788, Issue , 2005, Pages 69-72

  Senzaki, Yoshihide ^a   Choi, Kisik ^a   Kirsch, Paul D ^a   Majhi, Prashant ^a   Lee, Byoung Hun ^a  

^a SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33749661380     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2062940     Document Type: Conference Paper

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