Batch process for atomic layer deposition of hafnium silicate thin films on 300-mm-diameter silicon substrates

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 3, 2005, Pages 1-3

  Okuyama, Yoshi ^a   Barelli, Carl ^a   Tousseau, Christopher ^a   Park, Seung ^a   Senzaki, Yoshihide ^a,b  

^a Aviza Technology Inc   (United States)

^b SEMATECH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION (ALD); BATCH PROCESSES; HOT-WALL FURNACE SYSTEMS;

DEPOSITION; OZONE; SILICON WAFERS; THICKNESS MEASUREMENT; THIN FILMS;

HAFNIUM COMPOUNDS;

EID: 31044439530     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1887231     Document Type: Article

References (6)

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