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Volumn 3881, Issue , 1999, Pages 46-57
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Metal gates for advanced CMOS technology
a
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Author keywords
[No Author keywords available]
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Indexed keywords
CMOS INTEGRATED CIRCUITS;
DEPOSITION;
DIELECTRIC MATERIALS;
ELECTRIC CONDUCTIVITY;
ELECTRODES;
INTEGRATED CIRCUIT MANUFACTURE;
MOSFET DEVICES;
RELIABILITY;
SEMICONDUCTING SILICON;
SEMICONDUCTOR DOPING;
THERMODYNAMIC STABILITY;
THRESHOLD VOLTAGE;
CHANNEL ENGINEERING;
GATE DIELECTRIC;
METAL GATES;
POLY DEPLETION;
POLYSILICON GATE ELECTRODES;
GATES (TRANSISTOR);
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EID: 0033346433
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.360560 Document Type: Conference Paper |
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Times cited : (16)
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References (71)
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