-
3
-
-
0001745014
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.47.6791
-
J. E. Northrup and S. B. Zhang, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.47.6791 47, R6791 (1993).
-
(1993)
Phys. Rev. B
, vol.47
, pp. 6791
-
-
Northrup, J.E.1
Zhang, S.B.2
-
4
-
-
4243618941
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.47.9425
-
C. G. Van de Walle, D. B. Laks, G. F. Neumark, and S. T. Pantelides, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.47.9425 47, 9425 (1993).
-
(1993)
Phys. Rev. B
, vol.47
, pp. 9425
-
-
Van De Walle, C.G.1
Laks, D.B.2
Neumark, G.F.3
Pantelides, S.T.4
-
5
-
-
0032607252
-
-
APPLAB 0003-6951 10.1063/1.123742
-
L. Pelaz, G. H. Gilmer, V. C. Venezia, H.-J. Gossmann, M. Jaraiz, and J. Barbolla, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.123742 74, 2017 (1999).
-
(1999)
Appl. Phys. Lett.
, vol.74
, pp. 2017
-
-
Pelaz, L.1
Gilmer, G.H.2
Venezia, V.C.3
Gossmann, H.-J.4
Jaraiz, M.5
Barbolla, J.6
-
7
-
-
0001499855
-
-
APPLAB 0003-6951 10.1063/1.116701
-
M. Jaraiz, G. H. Gilmer, J. M. Poate, and T. D. de la Rubia, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.116701 68, 409 (1996).
-
(1996)
Appl. Phys. Lett.
, vol.68
, pp. 409
-
-
Jaraiz, M.1
Gilmer, G.H.2
Poate, J.M.3
De La Rubia, T.D.4
-
8
-
-
27144532574
-
-
IEDM 2001 proceedings
-
M. Hane, T. Ikezawa, K. Takeuchi, and G. H. Gilmer, IEDM 2001 proceedings, 2001, p. 38.4.1.
-
(2001)
, pp. 3841
-
-
Hane, M.1
Ikezawa, T.2
Takeuchi, K.3
Gilmer, G.H.4
-
9
-
-
3242887864
-
-
edited by H. Iwai, SISPAD (Electronic Society
-
M. Yu, R. Huang, X. Zhang, Y. Wang, and H. Oka, in IEICE Transactions of Electronics edited by, H. Iwai,, SISPAD (Electronic Society, 2003), Vol. E86-C, pp. 295-300.
-
(2003)
IEICE Transactions of Electronics
, vol.E86-C
, pp. 295-300
-
-
Yu, M.1
Huang, R.2
Zhang, X.3
Wang, Y.4
Oka, H.5
-
10
-
-
3042753783
-
-
edited by D. Tsoukalas and C. Tsamis, (Vienna
-
M. Jaraiz, P. Castrillo, R. Pinacho, I. Martin-Bragado, and J. Barbolla, in Simulation of Semiconductor Processes and Devices 2001, edited by, D. Tsoukalas, and, C. Tsamis,, (Vienna, 2001), pp. 10-17.
-
(2001)
Simulation of Semiconductor Processes and Devices 2001
, pp. 10-17
-
-
Jaraiz, M.1
Castrillo, P.2
Pinacho, R.3
Martin-Bragado, I.4
Barbolla, J.5
-
11
-
-
27144496831
-
-
C. Rafferty, International Conference on simulation of semiconductor processes and devices (SISPAD 1997).
-
(1997)
-
-
Rafferty, C.1
-
13
-
-
0034240512
-
-
MSSPFQ 1369-8001 10.1016/S1369-8001(00)00037-8
-
G. D. Watkins, Mater. Sci. Semicond. Process. MSSPFQ 1369-8001 10.1016/S1369-8001(00)00037-8 3, 227 (2000).
-
(2000)
Mater. Sci. Semicond. Process.
, vol.3
, pp. 227
-
-
Watkins, G.D.1
-
14
-
-
0033908116
-
-
MSBTEK 0921-5107 10.1016/S0921-5107(99)00367-0
-
A. Giese, H. Bracht, N. A. Stolwijk, and D. Baither, Mater. Sci. Eng., B MSBTEK 0921-5107 10.1016/S0921-5107(99)00367-0 B71, 160 (2000).
-
(2000)
Mater. Sci. Eng., B
, vol.71
, pp. 160
-
-
Giese, A.1
Bracht, H.2
Stolwijk, N.A.3
Baither, D.4
-
15
-
-
0000971763
-
-
CMMSEM 0927-0256 10.1016/S0927-0256(98)00023-8
-
J. Zhu, Comput. Mater. Sci. CMMSEM 0927-0256 10.1016/S0927-0256(98)00023- 8 12, 309 (1998).
-
(1998)
Comput. Mater. Sci.
, vol.12
, pp. 309
-
-
Zhu, J.1
-
16
-
-
0042549146
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.57.9727
-
W. A. Harrison, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.57.9727 57, 9727 (1998).
-
(1998)
Phys. Rev. B
, vol.57
, pp. 9727
-
-
Harrison, W.A.1
-
17
-
-
0014809348
-
-
RAEFBL 0033-7579
-
K. P. Chik, Radiat. Eff. RAEFBL 0033-7579 4, 33 (1970).
-
(1970)
Radiat. Eff.
, vol.4
, pp. 33
-
-
Chik, K.P.1
-
18
-
-
0031340332
-
-
Materials Research Society, Washington, D.C.
-
H. Bracht and A. R. Schachtrup, in Defects and Diffusion in Silicon Processing (Materials Research Society, Washington, D.C., 1997), Vol. 469, pp. 25-36.
-
(1997)
Defects and Diffusion in Silicon Processing
, vol.469
, pp. 25-36
-
-
Bracht, H.1
Schachtrup, A.R.2
-
19
-
-
0000543030
-
-
PRBMDO 0163-1829 10.1103/PhysRevB.52.16542
-
H. Bracht, N. A. Stolwijk, and H. Mehrer, Phys. Rev. B PRBMDO 0163-1829 10.1103/PhysRevB.52.16542 52, 16542 (1995).
-
(1995)
Phys. Rev. B
, vol.52
, pp. 16542
-
-
Bracht, H.1
Stolwijk, N.A.2
Mehrer, H.3
-
20
-
-
0033298534
-
-
MSSPFQ 1369-8001 10.1016/S1369-8001(99)00039-6
-
N. E. B. Cowern, G. Mannino, P. A. Stolk, F. RoozeBoom, H. Huizing, J. van Berkum, F. Cristiano, A. Claverie, and M. Jaraiz, Mater. Sci. Semicond. Process. MSSPFQ 1369-8001 10.1016/S1369-8001(99)00039-6 2, 369 (1999).
-
(1999)
Mater. Sci. Semicond. Process.
, vol.2
, pp. 369
-
-
Cowern, N.E.B.1
Mannino, G.2
Stolk, P.A.3
Roozeboom, F.4
Huizing, H.5
Van Berkum, J.6
Cristiano, F.7
Claverie, A.8
Jaraiz, M.9
-
21
-
-
0000605251
-
-
PLRBAQ 0556-2805 10.1103/PhysRevB.12.5824
-
G. D. Watkins, Phys. Rev. B PLRBAQ 0556-2805 10.1103/PhysRevB.12.5824 12, 5824 (1975).
-
(1975)
Phys. Rev. B
, vol.12
, pp. 5824
-
-
Watkins, G.D.1
-
24
-
-
0000426452
-
-
APPLAB 0003-6951 10.1063/1.1313248
-
Y. M. Haddara, B. T. Folmer, M. E. Law, and T. Buyuklimanli, Appl. Phys. Lett. APPLAB 0003-6951 10.1063/1.1313248 77, 1976 (2000).
-
(2000)
Appl. Phys. Lett.
, vol.77
, pp. 1976
-
-
Haddara, Y.M.1
Folmer, B.T.2
Law, M.E.3
Buyuklimanli, T.4
-
25
-
-
0000065634
-
-
PRLTAO 0031-9007 10.1103/PhysRevLett.83.4345
-
W. Windl, M. M. Bunea, R. Stumpf, S. T. Dunham, and M. P. Masquelier, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.83.4345 83, 4345 (1999).
-
(1999)
Phys. Rev. Lett.
, vol.83
, pp. 4345
-
-
Windl, W.1
Bunea, M.M.2
Stumpf, R.3
Dunham, S.T.4
Masquelier, M.P.5
-
27
-
-
7544220968
-
-
PRLTAO 0031-9007 10.1103/PhysRevLett.76.4753
-
M. Ramamoorthy and S. T. Pantelides, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.76.4753 76, 4753 (1996).
-
(1996)
Phys. Rev. Lett.
, vol.76
, pp. 4753
-
-
Ramamoorthy, M.1
Pantelides, S.T.2
-
29
-
-
5544271304
-
-
PRLTAO 0031-9007 10.1103/PhysRevLett.67.212
-
N. E. B. Cowern, G. F. A. van de Walle, D. J. Gravesteijn, and C. J. Vriezema, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.67.212 67, 212 (1991).
-
(1991)
Phys. Rev. Lett.
, vol.67
, pp. 212
-
-
Cowern, N.E.B.1
Van De Walle, G.F.A.2
Gravesteijn, D.J.3
Vriezema, C.J.4
-
30
-
-
0000778916
-
-
PRLTAO 0031-9007 10.1103/PhysRevLett.65.2434
-
N. E. B. Cowern, K. T. F. Janssen, G. F. A. van de Walle, and D. J. Gravesteijn, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.65.2434 65, 2434 (1990).
-
(1990)
Phys. Rev. Lett.
, vol.65
, pp. 2434
-
-
Cowern, N.E.B.1
Janssen, K.T.F.2
Van De Walle, G.F.A.3
Gravesteijn, D.J.4
-
31
-
-
0036679146
-
-
JAPIAU 0021-8979 10.1063/1.1489715
-
R. Pinacho, P. Castrillo, M. Jaraiz, I. Martin-Bragado, and J. Barbolla, J. Appl. Phys. JAPIAU 0021-8979 10.1063/1.1489715 92, 1582 (2002).
-
(2002)
J. Appl. Phys.
, vol.92
, pp. 1582
-
-
Pinacho, R.1
Castrillo, P.2
Jaraiz, M.3
Martin-Bragado, I.4
Barbolla, J.5
-
32
-
-
11944271719
-
-
PRLTAO 0031-9007 10.1103/PhysRevLett.69.116
-
N. E. B. Cowern, G. F. A. van de Walle, P. C. Zalm, and D. J. Oostra, Phys. Rev. Lett. PRLTAO 0031-9007 10.1103/PhysRevLett.69.116 69, 116 (1992).
-
(1992)
Phys. Rev. Lett.
, vol.69
, pp. 116
-
-
Cowern, N.E.B.1
Van De Walle, G.F.A.2
Zalm, P.C.3
Oostra, D.J.4
-
33
-
-
27144527671
-
-
Materials Research Society, Washington, DC
-
Z. Qin and S. T. Dunham, Silicon Front-End Junction Formation Technologies (Materials Research Society, Washington, DC, 2002), Vol. 717.
-
(2002)
Silicon Front-End Junction Formation Technologies
, vol.717
-
-
Qin, Z.1
Dunham, S.T.2
-
34
-
-
0031380924
-
-
Materials Research Society, Washington, DC
-
H. S. Chao, P. B. Griffin, and J. D. Plummer, Materials Research Society Symposium Proceedings Vol. 469 (Materials Research Society, Washington, DC, 1997), Vol. 469, pp. 347-352.
-
(1997)
Materials Research Society Symposium Proceedings Vol. 469
, vol.469
, pp. 347-352
-
-
Chao, H.S.1
Griffin, P.B.2
Plummer, J.D.3
|