Pressure dependence of optical emission from DC magnetron sputtering plasma observed with spatial resolution

Vacuum

Volumn 59, Issue 2-3, 2000, Pages 581-585

  Nakano, Takeo ^a   Ohnuki, Noriyuki ^a   Baba, Shigeru ^a  

^a SEIKEI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0242304486     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(00)00319-5     Document Type: Article

References (10)

1. Mehdi T, Legrand PB, Dauchot JP, Wautelet M, Hecq M. Spectrochim Acta 1993;48B:1023.
2. Dony MF, Ricard A, Dauchot JP, Hecq M, Wautelet M. Surf Coatings Technol 1995;74-75:479.
3. Dony MF, Ricard A, Wautelet M, Dauchot JP, Hecq M. J Vac Sci Technol A 1997;15:1890.
4. Radzimski ZJ, Hankins OE, Cuomo WPPJJ, Shingubara S. J Vac Sci Technol B 1997;15:202.
5. Rossnagel SM. J Vac Sci Technol B 1998;16:2585.
6. Sheridan TE, Goeckner MJ, Goree J. J Vac Sci Technol A 1990;8:30.
7. Miyake S, Shimura N, Makabe T. J Vac Sci Technol A 1992;10:1135.
8. Horaguchi THT. Kyoto University Data Process Center Bull 1989;22:129.
9. Rhoades RL, Gorbatkin SM. J Appl Phys 1996;80:2605.
10. Turner GM, Falconer IS, James BW, McKenzie DR. J Appl Phys 1989;65:3671.