Chemical structure and surface morphology of plasma polymerized-allylamine film

Korean Journal of Chemical Engineering

Volumn 23, Issue 3, 2006, Pages 505-511

  Myung, Sung Woon ^a   Choi, Ho Suk ^a  

^a Chungnam National University   (South Korea)

Author keywords

Continuous Wave RF Discharge; Plasma polymerized allylamine; Surface Chemical Property; Surface Morphology

Indexed keywords

EID: 33748869474     PISSN: 02561115     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF02706757     Document Type: Article

References (41)

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