Study of plasma polymerization from acetylene in pulsed r.f. discharges

Thin Solid Films

Volumn 425, Issue 1-2, 2003, Pages 72-84

  Zajickova L ^a   Rudakowski, S ^b   Becker, H W ^b   Meyer, D ^b   Valtr, M ^a   Wiesemann, K ^b  

^a MASARYK UNIVERSITY   (Czech Republic)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Acetylene; Atomic force microscopy (AFM); Optical properties; Plasma enhanced CVD (PECVD)

Indexed keywords

ACETYLENE; ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; FILM GROWTH; MIXTURES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYMERIZATION; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

PLASMA POLYMER FILMS;

PLASTIC FILMS;

EID: 0037415758     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01133-1     Document Type: Article

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