High quality microcrystalline Si films by hydrogen dilution profile

Thin Solid Films

Volumn 515, Issue 2 SPEC. ISS., 2006, Pages 452-455

  Gu, Jinhua ^a   Zhu, Meifang ^a   Wang, Liujiu ^a   Liu, Fengzhen ^a   Zhou, Bingqing ^a   Ding, Kun ^b   Li, Guohua ^b  

^a UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^b INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

Hydrogen dilution profiling; Incubation layer; Microcrystalline Si thin film; Uniformity

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; HYDROGEN; NUCLEATION; PARAMETER ESTIMATION;

HYDROGEN DILUTION PROFILING; INCUBATION LAYER; MICROCRYSTALLINE SI THIN FILM; UNIFORMITY;

THIN FILMS;

EID: 33748759259     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.12.255     Document Type: Article

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