From porous to compact films by changing the onset conditions of HW-CVD process

Thin Solid Films

Volumn 427, Issue 1-2, 2003, Pages 225-230

  Ferreira, I ^a   Costa, M E V ^b   Fortunato, E ^a   Martins, R ^a  

^a UNIVERSIDADE NOVA DE LISBOA   (Portugal)

^b UNIVERSITY OF AVEIRO   (Portugal)

Author keywords

Compactness; Doped microcrystalline silicon films; HW CVD

Indexed keywords

ACTIVATION ENERGY; CHEMICAL VAPOR DEPOSITION; COMPACTION; ELECTRIC CONDUCTIVITY; HYDROGEN; POROUS SILICON;

COMPACT FILMS;

AMORPHOUS FILMS;

EID: 0037416674     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)01186-0     Document Type: Conference Paper

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