Scaling of hollow cathode magnetrons for ionized metal physical vapor deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 5, 2006, Pages 1955-1969

  Vyas, Vivek ^a,c   Kushner, Mark J ^b  

^a United States of America   (United States)

^b Iowa State University   (United States)

^c INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION PROCESS; DIFFUSION BARRIERS; HOLLOW CATHODE MAGNETRONS (HCM); HYBRID MODELS;

ALGORITHMS; CATHODES; IONIZATION; MAGNETIC FIELDS; MICROELECTRONICS; OPTIMIZATION; PHYSICAL VAPOR DEPOSITION; PRESSURE EFFECTS;

MAGNETRONS;

EID: 33748524584     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2335864     Document Type: Article

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