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Volumn 600, Issue 17, 2006, Pages 3496-3501

Initial stage of nitridation on Si(1 0 0) surface using low-energy nitrogen ion implantation

Author keywords

Ion implantation; Silicon nitride; Synchrotron radiation photoemission spectroscopy

Indexed keywords

ANNEALING; ION IMPLANTATION; PHOTOEMISSION; SILICON NITRIDE; SPECTROSCOPIC ANALYSIS; SYNCHROTRON RADIATION;

EID: 33748307398     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.07.015     Document Type: Article
Times cited : (6)

References (22)
  • 4
    • 0033600266 scopus 로고    scopus 로고
    • Schulz M. Nature 399 (1999) 729
    • (1999) Nature , vol.399 , pp. 729
    • Schulz, M.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.