Photoemission spectroscopy of the evolution of ultra-thin Co films on Si(111) substrates upon annealing temperature

Applied Surface Science

Volumn 161, Issue 1, 2000, Pages 268-275

  Kim, Ki Jeong ^a   Kang, Tai Hee ^a   Kim, Kwang Woo ^a   Shin, Hyun Joon ^a   Kim, Bongsoo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COBALT; EMISSION SPECTROSCOPY; INTERFACES (MATERIALS); LOW ENERGY ELECTRON DIFFRACTION; PHOTOEMISSION; PHOTONS; SEMICONDUCTING SILICON; SYNCHROTRON RADIATION; TEMPERATURE;

PHOTOEMISSION SPECTROSCOPY; SILICON SUBSTRATES; ULTRATHIN COBALT FILMS; VALENCE BAND MEASUREMENTS;

ULTRATHIN FILMS;

EID: 0034229518     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00306-8     Document Type: Article

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