Eddy current evaluation for a high-resolution EB system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4186, Issue , 2001, Pages 460-467

  Shimomura, N ^a   Ogasawara, M ^a   Hattori, K ^a   Takamatsu, J ^a   Sunaoshi, H ^a   Yoshitake, S ^a   Fukudome, Y ^a   Akeno, K ^a  

^a Toshiba Machine Co Ltd   (Japan)

Author keywords

Beam resolution; Eddy current; Electron beam; Semi in lens

Indexed keywords

COMPUTER SIMULATION; EDDY CURRENTS; FINITE ELEMENT METHOD; MAGNETIC FIELD EFFECTS; OPTICAL RESOLVING POWER;

ELECTRON BEAM (EB) OPTICAL SYSTEMS;

ELECTRON BEAMS;

EID: 0035050172     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.410723     Document Type: Conference Paper

References (3)

1. Optical column of the mask-scan EB mask writer test stand
2. Accuracy of exposure during continuous stage movement in a variable shaped vector scanning B lithography system
3. Numerical analysis of electron beam lithography systems. Part III: Calculation of the optical properties of electron focusing systems and dual-channel deflection systems with combined magnetic and electrostatic fields