Mechanical system construction for the EX-11 electron beam mask writer: A solution fort 100 nm wafer lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 20, Issue 1, 2002, Pages 311-315

  Akeno, Kiminobu ^a   Ogasawara, Munehiro ^a   Tojo, Toru ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; FRICTION; MASKS; MECHANICAL DRIVES; TEMPERATURE CONTROL; THERMAL EFFECTS; VIBRATION CONTROL; VIBRATIONS (MECHANICAL);

ELECTRON BEAM MASK WRITERS; MECHANICAL SYSTEMS;

PHOTOLITHOGRAPHY;

EID: 0036120916     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1446452     Document Type: Conference Paper

References (5)