Development of a fast beam-blanking system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3412, Issue , 1998, Pages 79-85

  Ogasawara, Munehiro ^a   Sunaoshii, Hitoshi ^a   Yoshikawa, Ryoichi ^b  

^a TOSHIBA CORPORATION   (Japan)

^b Toshiba Machine Co Ltd   (Japan)

Author keywords

Blanker; Electron optics; Lithography; Multipass writing; Proximity effect correction

Indexed keywords

COMPUTER SIMULATION; ELECTROOPTICAL EFFECTS; LASER PULSES; LITHOGRAPHY; REFLECTION; SYSTEMS ANALYSIS;

BEAM PULSE; BLANKER; BLANKER DRIVING CIRCUIT; FAST BEAM BLANKING SYSTEM; PROXIMITY EFFECT CORRECTION; WAVEFORM DISTORTION;

ELECTRON BEAMS;

EID: 0038335893     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.328808     Document Type: Conference Paper

References (5)

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