Advanced electron beam writing system EX-11 for next-generation mask fabrication

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3748, Issue , 1999, Pages 416-425

  Tojo, Toru ^a   Yoshikawa, Ryoichi ^a   Ogawa, Yoji ^a   Tamamushi, Shuichi ^a   Hattori, Yoshiaki ^a   Koikari, Souji ^a   Kusakabe, Hideo ^a   Abe, Takayuki ^a   Ogasawara, Munehiro ^a   Akeno, Kiminobu ^a   Anze, Hirohito ^a   Hattori, Kiyoshi ^a   Hirano, Ryoichi ^a   Yoshitake, Shusuke ^a   Iijima, Tomohiro ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL DIMENSION (CD) ACCURACY CONTROL; REAL TIME PROXIMITY EFFECT CORRECTION;

MASKS; SEMICONDUCTOR DEVICE MANUFACTURE; VIBRATION CONTROL;

ELECTRON BEAM LITHOGRAPHY;

EID: 0032642749     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Article

References (19)