What controls deposition rate in electron-beam chemical vapor deposition?

Physical Review Letters

Volumn 97, Issue 8, 2006, Pages

  White, William B ^a   Rykaczewski, Konrad ^a   Fedorov, Andrei G ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODEPOSITION; ELECTRON BEAMS; METHANE; NANOSTRUCTURED MATERIALS; SILICON; TRANSPORT PROPERTIES;

ELECTRON-BEAM CHEMICAL VAPOR DEPOSITION; NANOSCALE DEPOSITS; PRECURSOR GAS; SILICON SUBSTRATES;

CHEMICAL VAPOR DEPOSITION;

EID: 33747705542     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.97.086101     Document Type: Article

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