XPS study of the a-C:H/Ti and a-C:H/a-Si interfaces

Vacuum

Volumn 80, Issue 9, 2006, Pages 1007-1011

  Meskinis S ^a   Andrulevicius M ^a   Tamulevicius S ^a,b   Kopustinskas, V ^a   Slapikas K ^a   Jankauskas, J ^b   Ciziute B ^b  

^a KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

^b KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

Author keywords

a Si interlayer; Ion beam deposition; Ti interlayer; Ultrathin a C:H films; XPS

Indexed keywords

AMORPHOUS MATERIALS; HYDROCARBONS; HYDROGENATION; INTERFACES (MATERIALS); ION BEAMS; SILICON; TITANIUM; X RAY PHOTOELECTRON SPECTROSCOPY;

A-SI INTERLAYER; ION BEAM DEPOSITION; TI INTERLAYER; ULTRATHIN A-C:H FILMS;

ULTRATHIN FILMS;

EID: 33747081987     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2006.01.008     Document Type: Article

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