Diffusion-modified boride interlayers for chemical vapour deposition of low-residual-stress diamond films on steel substrates

Thin Solid Films

Volumn 426, Issue 1-2, 2003, Pages 85-93

  Buijnsters, J G ^a   Shankar, P ^a,c   Gopalakrishnan, P ^b   Van Enckevort, W J P ^a   Schermer, J J ^a   Ramakrishnan, S S ^b   Ter Meulen, J J ^a  

^a RADBOUD UNIVERSITY NIJMEGEN   (Netherlands)

^b PSG COLLEGE OF TECHNOLOGY   (India)

^c INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

Boride interlayer; Diamond film; Residual stress

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIFFUSION; MICROSTRUCTURE; RAMAN SPECTROSCOPY; RESIDUAL STRESSES; SCANNING ELECTRON MICROSCOPY; STAINLESS STEEL; X RAY DIFFRACTION ANALYSIS;

DIAMOND COATINGS;

DIAMOND FILMS;

EID: 0037463138     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(03)00013-0     Document Type: Article

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