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Diamond and Related Materials

Volumn 11, Issue 9, 2002, Pages 1617-1622

Microwave plasma chemical vapour deposition diamond nucleation on ferrous substrates with Ti and Cr interlayers

(7) Silva, F J G a Baptista, A P M b Pereira, E c Teixeira, V d Fan, Q H c Fernandes, A J S c Costa, F M c

a INSTITUTO SUPERIOR DE ENGENHARIA DO PORTO (Portugal)

b UNIVERSITY OF PORTO (Portugal)

c UNIVERSITY OF AVEIRO (Portugal)

d UNIVERSITY OF MINHO (Portugal)

Author keywords

Adhesion; Chemical vapour deposition diamond; Tool coatings

Indexed keywords

CHROMIUM; ELECTROPLATING; GROWTH (MATERIALS); HARDNESS; IRON ALLOYS; MORPHOLOGY; NUCLEATION; PHYSICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROFILOMETRY; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SYNTHETIC DIAMONDS; TITANIUM; WEAR RESISTANCE;

DIAMOND QUALITY;

MICROWAVES;

ADHESION; DIAMOND COATING; FILM; TOOL WEAR; TRIBOLOGY; VAPOR DEPOSITION;

EID: 0036721264 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(02)00029-8 Document Type: Article

Times cited : (66)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.