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Volumn 11, Issue 9, 2002, Pages 1617-1622

Microwave plasma chemical vapour deposition diamond nucleation on ferrous substrates with Ti and Cr interlayers

Author keywords

Adhesion; Chemical vapour deposition diamond; Tool coatings

Indexed keywords

CHROMIUM; ELECTROPLATING; GROWTH (MATERIALS); HARDNESS; IRON ALLOYS; MORPHOLOGY; NUCLEATION; PHYSICAL VAPOR DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PROFILOMETRY; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SPUTTERING; SYNTHETIC DIAMONDS; TITANIUM; WEAR RESISTANCE;

EID: 0036721264     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(02)00029-8     Document Type: Article
Times cited : (64)

References (18)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.