Thickness of SiO2 thin film on silicon wafer measured by dispersive white-light spectral interferometry

Applied Physics B: Lasers and Optics

Volumn 84, Issue 3, 2006, Pages 511-516

  Hlubina, P ^a   Ciprian, D ^a   Lunacek J ^a   Lesnak M ^a  

^a VSB TECHNICAL UNIVERSITY OF OSTRAVA   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

FIBER OPTICS; INTERFEROMETRY; OPTICAL BEAM SPLITTERS; OPTICAL GLASS; SILICA; SILICON WAFERS;

MICHELSON INTERFEROMETER; OPTICAL CONSTANTS; SIO2 THIN FILMS; THIN-FILM STRUCTURE;

THIN FILMS;

EID: 33746800217     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-006-2282-2     Document Type: Article

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