Evolution of mosaic structure in InN grown by metalorganic chemical vapor deposition

Journal of Crystal Growth

Volumn 293, Issue 2, 2006, Pages 269-272

  Huang, Y ^a   Wang, H ^a   Sun, Q ^a   Chen, J ^a   Li, D Y ^a   Zhang, J C ^a   Wang, J F ^a   Wang, Y T ^a   Yang, H ^a  

^a INSTITUTE OF SEMICONDUCTORS   (China)

Author keywords

A1. Growth mode; A1. X ray diffraction; A3. Metalorganic chemical vapor deposition; B1. Indium nitride

Indexed keywords

FILM GROWTH; METALLORGANIC CHEMICAL VAPOR DEPOSITION; NUCLEATION; SEMICONDUCTING INDIUM COMPOUNDS; X RAY DIFFRACTION;

GROWTH MODE; IN-PLANE ROTATION; INDIUM NITRIDE; MORPHOLOGICAL DIFFERENCE;

THIN FILMS;

EID: 33746449987     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.05.073     Document Type: Article

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