Influence of the rapid thermal annealing in vacuum on the XPS characteristics of thin SiO 2

Applied Surface Science

Volumn 103, Issue 4, 1996, Pages 359-367

  Atanassova, E ^a   Paskaleva, A ^a  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

DECOMPOSITION; SILICA; SILICON; STOICHIOMETRY; THERMAL EFFECTS; THIN FILMS; VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

PINHOLES; RAPID THERMAL ANNEALING; SUBOXIDES;

ANNEALING;

EID: 0030394268     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(96)00556-9     Document Type: Article

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