Preparation and characterization of tantalum oxide films produced by reactive DC magnetron sputtering

Physica Status Solidi (A) Applied Research

Volumn 198, Issue 1, 2003, Pages 99-110

  Ngaruiya, J M ^a,b   Venkataraj, S ^a   Drese, R ^a   Kappertz, O ^a   Leervad Pedersen, T P ^a   Wuttig, M ^a,c  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b KENYATTA UNIVERSITY   (Kenya)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

COMPOSITION; COMPRESSIVE STRESS; CRYSTAL STRUCTURE; DENSITY (OPTICAL); ENERGY GAP; FILM PREPARATION; MAGNETRON SPUTTERING; REFRACTIVE INDEX; STRESS ANALYSIS; SUBSTRATES; TRANSPARENCY;

OPTICAL SPECTROSCOPY; OXYGEN FLOW RATES; SPUTTER CURRENT; TANTALUM OXIDE FILMS; X RAY REFLECTOMETRY;

TANTALUM COMPOUNDS;

EID: 0041508222     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.200306444     Document Type: Article

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