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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 6 B, 2006, Pages 5545-5547

Nano-ablation of inorganic materials using laser plasma soft X-rays at around 10 nm

(6) Makimura, Tetsuya a Miyamoto, Hisao a Uchida, Satoshi a Fujimori, Takashige a Niino, Hiroyuki b Murakami, Kouichi a

a UNIVERSITY OF TSUKUBA (Japan)

b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST (Japan)

Author keywords

Ablation; EUV; Inorganic materials; Laser plasma; Nanomachining; Quartz glass; Silica glass; Soft X rays; Transparent materials

Indexed keywords

FUSED SILICA; IRRADIATION; LASER ABLATION; MASKS; QUARTZ; SURFACE ROUGHNESS; X RAYS;

INORGANIC MATERIALS; LASER PLASMA; NANOMACHINING; QUARTZ GLASS; SOFT X-RAYS; TRANSPARENT MATERIALS;

INORGANIC COMPOUNDS;

EID: 33745659655 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.45.5545 Document Type: Review

Times cited : (7)

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