E-beam probe station with integrated tool for electron beam induced etching

Microelectronic Engineering

Volumn 31, Issue 1-4, 1996, Pages 141-147

  Winkler, Dieter ^a   Zimmermann, Hans ^a   Mangerich, Margot ^a   Trauner, Robert ^a  

^a Applied Materials   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CONDUCTORS; ELECTRIC INSULATING MATERIALS; ELECTRON BEAMS; ETCHING; INTEGRATED CIRCUITS; PASSIVATION; POLYIMIDES; SILICA; SILICON NITRIDE; SUBSTRATES;

CAPACITIVE VOLTAGE PROBING; CHEMICAL REMOVAL; ELECTRON BEAM INDUCED ETCHING; ELECTRON BEAM PROBING; FOCUSED ION BEAMS; IDEAL PLATE CAPACITOR;

MICROELECTRONIC PROCESSING;

EID: 0030084105     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/0167-9317(95)00336-3     Document Type: Article

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