Monitoring photoresist dissolution in supercritical carbon dioxide using a quartz crystal microbalance

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6153 II, Issue , 2006, Pages

  Zweber, Amy E ^a   Carbonell, Ruben G ^a  

^a North Carolina State University   (United States)

Author keywords

Carbon dioxide; Development; Image collapse; Lithography; Quartz crystal microbalance

Indexed keywords

DEVELOPMENT; IMAGE COLLAPSE; QUARTZ CRYSTAL MICROBALANCE;

ACTIVATION ENERGY; CARBON DIOXIDE; DISSOLUTION; HIGH PRESSURE EFFECTS; MICROELECTRONICS; SUPERCRITICAL FLUIDS;

PHOTORESISTS;

EID: 33745616137     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.655659     Document Type: Conference Paper

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