Effect of nanoscale confinement on the diffusion behavior of photoresist polymer thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5376, Issue PART 1, 2004, Pages 369-378

  Singh, Lovejeet ^a   Ludovice, Peter J ^a   Henderson, Clifford L ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Diffusion coefficient; Polymer thin film; Quartz Crystal Microbalance

Indexed keywords

CHEMICALLY AMPLIFIED PHOTORESISTS (CAR); THIN POLYMER FILMS;

ACETIC ACID; BENZENE; CRYSTALS; DIFFUSION; ELECTRIC POTENTIAL; ELECTRON BEAM LITHOGRAPHY; MICROELECTRONICS; MOLECULAR WEIGHT; PLASTIC FILMS; QUARTZ; ULTRATHIN FILMS; WATER;

PHOTORESISTS;

EID: 3843100285     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.535333     Document Type: Conference Paper

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