High-performance imprint lithography and novel metrology methods using multifunctional perfluoropolyethers

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6152 II, Issue , 2006, Pages

  Rothrock, Ginger Denison ^a   Maynor, Benjamin ^b   Rolland, Jason P ^a   Desimone, Joseph M ^b,c  

^a Liquidia Technologies   (United States)

^b University of North Carolina at Chapel Hill   (United States)

^c North Carolina State University   (United States)

Author keywords

Dual damascene metrology; Imprint lithography; Perfluoropolyether; Semiconductor metrology; Soft lithography; Wafer defect inspection

Indexed keywords

CHEMICAL RESISTANCE; CONDUCTIVE PLASTICS; ELASTOMERS; ETHERS; FLUORINE CONTAINING POLYMERS; QUARTZ;

DUAL DAMASCENE METROLOGY; IMPRINT LITHOGRAPHY; PERFLUOROPOLYETHERS; SEMICONDUCTOR METROLOGY; SOFT LITHOGRAPHY; WAFER DEFECT INSPECTION;

LITHOGRAPHY;

EID: 33745598809     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.656532     Document Type: Conference Paper

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