Stress evolution as a function of substrate bias in rf magnetron sputtered yttria-stabilized zirconia films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 4, 2006, Pages 1091-1095

  Piascik, Jeffrey R ^a,b   Thompson, Jeffrey Y ^a,c   Bower, Christopher A ^b   Stoner, Brian R ^a,b  

^a UNIVERSITY OF NORTH CAROLINA   (United States)

^b RTI INTERNATIONAL   (United States)

^c The University of Texas at San Antonio   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INTERGRANULAR PORES; INTERGRANULAR POROSITY; MONOCLINIC PHASE TRANSFORMATION; ZIRCONIA FILMS;

ATMOSPHERIC HUMIDITY; COMPRESSIVE STRESS; POROSITY; TRANSMISSION ELECTRON MICROSCOPY; YTTRIUM; ZIRCONIUM;

THIN FILMS;

EID: 33745487023     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2210949     Document Type: Article

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