Phase Formation and Stability in Reactively Sputter Deposited Yttria-Stabilized Zirconia Coatings

Journal of the American Ceramic Society

Volumn 84, Issue 5, 2001, Pages 929-936

  Ji, Zhiqiang ^a   Haynes, J Allen ^b   Voelkl, Edgar ^b   Rigsbee, J Michael ^c  

^a UNIVERSITY OF ALABAMA AT BIRMINGHAM   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

^c North Carolina State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL STRUCTURE; HIGH TEMPERATURE OPERATIONS; MAGNETRON SPUTTERING; PHASE TRANSITIONS; PLASMAS; SPUTTER DEPOSITION; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; YTTRIUM COMPOUNDS; ZIRCONIA;

HIGH TEMPERATURE ANNEALING; METALLIC ZIRCONIUM; PHASE STABILITY; YTTRIA COATINGS; YTTRIA-STABILIZED ZIRCONIA COATING;

CERAMIC COATINGS;

EID: 0035353957     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2001.tb00770.x     Document Type: Article

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