Growth of Tetragonal Zirconia Coatings by Reactive Sputter Deposition

Journal of the American Ceramic Society

Volumn 84, Issue 3-12, 2001, Pages 2841-2844

  Ji, Zhiqiang ^a,c   Rigsbee, J M ^b  

^a University of Alabama at Birmingham   (United States)

^b North Carolina State University   (United States)

^c MAXTOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTAL GROWTH; CRYSTAL ORIENTATION; CRYSTAL STRUCTURE; MAGNETRON SPUTTERING; PHASE EQUILIBRIA; SUBSTRATES; THERMODYNAMIC STABILITY; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; ZIRCONIA;

MONOCLINIC STRUCTURE; POST DEPOSITION ANNEALING TEMPERATURE; REACTIVE SPUTTER DEPOSITION; ROOM TEMPERATURE STABILIZATION;

INORGANIC COATINGS;

EID: 0035790110     PISSN: 00027820     EISSN: None     Source Type: Journal    
DOI: 10.1111/j.1151-2916.2001.tb01102.x     Document Type: Article

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