Evaluation of crystallinity and film stress in yttria-stabilized zirconia thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 5, 2005, Pages 1419-1424

  Piascik, Jeffrey R ^a,b   Thompson, Jeffrey Y ^c   Bower, Christopher A ^b   Stoner, Brian R ^a,b  

^a UNIVERSITY OF NORTH CAROLINA   (United States)

^b RTI INTERNATIONAL   (United States)

^c UNIVERSITY OF NORTH CAROLINA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLINITY; FILM STRESS; GAS COMPOSITIONS;

COMPOSITION; COMPRESSIVE STRESS; CRYSTALLIZATION; MAGNETRON SPUTTERING; REFRACTIVE INDEX; SPUTTER DEPOSITION; STRESS ANALYSIS; X RAY DIFFRACTION ANALYSIS; YTTRIUM COMPOUNDS; ZIRCONIA;

THIN FILMS;

EID: 31144456350     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2011403     Document Type: Article

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