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Volumn 407, Issue 4-6, 2005, Pages 272-275

Atomic layer deposition of hafnium nitrides using ammonia and alkylamide precursors

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ANALYSIS; ADSORPTION; AMMONIA; DEPOSITION; FILM GROWTH; HAFNIUM COMPOUNDS; ORGANIC COMPOUNDS; PHASE EQUILIBRIA; PLASTIC FILMS; THERMODYNAMIC STABILITY; VAPOR PRESSURE;

EID: 18244376110     PISSN: 00092614     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cplett.2005.03.084     Document Type: Article
Times cited : (12)

References (14)
  • 9
    • 18244394602 scopus 로고    scopus 로고
    • J. Han, C.B. Musgrave, submitted
    • J. Han, C.B. Musgrave, submitted


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.