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Volumn 407, Issue 4-6, 2005, Pages 272-275
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Atomic layer deposition of hafnium nitrides using ammonia and alkylamide precursors
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Author keywords
[No Author keywords available]
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Indexed keywords
ACTIVATION ANALYSIS;
ADSORPTION;
AMMONIA;
DEPOSITION;
FILM GROWTH;
HAFNIUM COMPOUNDS;
ORGANIC COMPOUNDS;
PHASE EQUILIBRIA;
PLASTIC FILMS;
THERMODYNAMIC STABILITY;
VAPOR PRESSURE;
ATOMIC LAYER DEPOSITION;
ATOMISTIC MECHANISMS;
LIGAND-EXCHANGE MECHANISMS;
PRECURSORS;
NITRIDES;
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EID: 18244376110
PISSN: 00092614
EISSN: None
Source Type: Journal
DOI: 10.1016/j.cplett.2005.03.084 Document Type: Article |
Times cited : (12)
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References (14)
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