Structural and optical properties of direct current sputtered zinc aluminum oxides with a high Al concentration

Thin Solid Films

Volumn 513, Issue 1-2, 2006, Pages 64-71

  Mohamed, S H ^a   Drese, R ^b  

^a SOHAG UNIVERSITY   (Egypt)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Dc sputtering; Optical properties; Structural properties; Zn Al O

Indexed keywords

CONCENTRATION (PROCESS); MAGNETRON SPUTTERING; POROSITY; REFRACTIVE INDEX; SUBSTRATES; SURFACE ROUGHNESS; X RAY ANALYSIS;

STRUCTURAL PROPERTIES; ZINC ALUMINUM OXIDE FILMS; ZN/AL-O;

ZINC OXIDE;

EID: 33745232482     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.01.014     Document Type: Article

References (36)

1. Kwon C.H., Hong H.-K., Yun D.H., Lee K., Kim S.-T., Roh Y.-H., and Lee B.-H. Sens. Actuators, B, Chem. 24/25 (1995) 610
2. Ma T.Y., and Lee S.C. J. Mater. Sci. 11 (2000) 305
3. Kim K.H., Park K.C., and Ma T.Y. J. Appl. Phys. 81 (1997) 7764
4. Gardeniers J.G.E., Rittersma Z.M., and Burger G.J. J. Appl. Phys. 83 (1998) 7844
5. Chang S.J., Su Y.K., and Shei Y.P. J. Vac. Sci. Technol., A, Vac. Surf. Films 13 (1995) 385
6. Park S.-H.K., Lee J.-I., Hwang C.-S., and Chu H.Y. Jpn. J. Appl. Phys. 44 (2005) L242
7. Sernelius B.E., and Berggren K.F. Phys. Rev., B 37 (1988) 10244
8. Elam J.W., Routkevitch D., and George S.M. J. Electrochem. Soc. 150 (2003) G339
9. Tominaga K., and Kataoka M. Thin Solid Films 290/291 (1996) 84
10. Lee H.W., Lau S.P., Wang Y.G., Tse K.Y., Hng H.H., and Tay B.K. J. Cryst. Growth 268 (2004) 596
11. Ma J., and Feng J. Thin Solid Films 279 (1996) 213
12. Zafar S., Ferekides F., and Morel D.L. J. Vac. Sci. Technol., A, Vac. Surf. Films 13 (1995) 2177
13. Tang W., and Cameron D.C. Thin Solid Films 238 (1994) 83
14. Islam M.N. Thin Solid Films 280 (1996) 20
15. Sieber I., Wanderka N., Urban I., Dorfel I., Schierhorn E., Fenske F., and Fuhs W. Thin Solid Films 330 (1998) 108
16. Pei Z.L., Sun C., Tan M.H., Xiao J.Q., Guan D.H., Huang R.F., and Wen L.S. J. Appl. Phys. 90 (2001) 3432
17. Sato H., Minami T., Takata S., Miyata T., and Ishii M. Thin Solid Films 236 (1993) 14
18. Canava B., Guillemoles J.-F., Yousfi E.-B., Cowache P., Kerber H., Loeffl A., Schock H.-W., Powalla M., Hariskos D., and Lincot D. Thin Solid Films 361/362 (2000) 187
19. Kappertz O., Drese R., and Wuttig M. J. Vac. Sci. Technol., A, Vac. Surf. Films 20 (2002) 2084
20. Lengeler B., and Hüppauff M.H. Fresenius J. Anal. Chem. USSR 346 (1993) 155
21. Chason E., and Mayer T.M. Crit. Rev. Solid State Mater. Sci. 22 (1997) 1
22. Nevot L., and Croce P. Rev. Phys. Appl. 15 (1980) 761
23. O'Leary S.K., Johnson S.R., and Lim P.K. J. Appl. Phys. 82 (1997) 3334
24. Theiss W. In: Theiss M. (Ed). SCOUT Thin Film Analysis Software Handbook (2000), Hard- and Software, Aachen, Germany. http://www.mtheiss.com www.mtheiss.com
25. Meng L.J., and Dos Santos M.P. Appl. Surf. Sci. 68 (1993) 319
26. Powder Diffraction File. Joint Committee on Powder Diffraction Standards, JCPDS (1998) Card 04-0831
27. Powder Diffraction File. Joint Committee on Powder Diffraction Standards, JCPDS (1998) Card 85-1327
28. Chen M., Pei Z., Sun C., Wen L., and Wang X. J. Cryst. Growth 220 (2000) 254
29. Ha W.H., Choo M.H., and Im S. J. Non-Cryst. Solids 203 (2002) 78
30. In: Frederikse H.P.R., and Lide D.R. (Eds). CRC Handbook of Chemistry and Physics. 78th edition (1997-1998), CRC Press
31. Landolt-Bornstein. In: Madelung O., Schulz M., and Weiss H. (Eds). Numerical Data and Functional Relationships in Science and Technology vol. 17b (1982), Springer-Verlag, Berlin 35
32. Mo S.-D., and Ching W.Y. Phys. Rev., B 57 (1998) 15219
33. Boettger J.C. Phys. Rev., B 55 (1997) 750
34. Khawaja E., Bouamrane F., Al-Adel F., Hallak A.B., Daous M.A., and Salim M.A. Thin Solid Films 240 (1994) 121
35. Mergel D., Buschendorf D., Eggert S., Grammes R., and Samest B. Thin Solid Films 371 (2000) 218
36. Mohamed S.H., Kappertz O., Leervad Pedersen T.P., Drese R., and Wuttig M. Phys. Status Solidi, A Appl. Res. 198 (2003) 224