Properties of TiOx coatings prepared by dc magnetron sputtering

Physica Status Solidi (A) Applied Research

Volumn 198, Issue 1, 2003, Pages 224-237

  Mohamed, S H ^a,b   Kappertz, O ^a   Leervad Pedersen, T P ^a   Drese, R ^a   Wuttig, M ^a,c  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b SOHAG UNIVERSITY   (Egypt)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; COMPRESSIVE STRESS; CRYSTALLINE MATERIALS; ENERGY GAP; FLOW OF FLUIDS; MAGNETRON SPUTTERING; OXYGEN; POROSITY; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; STOICHIOMETRY; TITANIUM OXIDES;

AMORPHOUS TITANIA FILM; CRYSTALLINE TITANIA FILM; OPTICAL BAND GAP; OXYGEN FLOW EFFECT; TITATIUM OXIDE FILM;

OPTICAL COATINGS;

EID: 0041508121     PISSN: 00318965     EISSN: None     Source Type: Journal    
DOI: 10.1002/pssa.200306597     Document Type: Article

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