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Volumn 55, Issue 4, 2006, Pages 283-286
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X-ray diffraction investigation of self-annealing in nanocrystalline copper electrodeposits
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Author keywords
Copper; Electroplating; Resistivity; Twinning; X ray diffraction
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Indexed keywords
ANNEALING;
COPPER;
CRYSTALLINE MATERIALS;
CRYSTALLOGRAPHY;
NANOSTRUCTURED MATERIALS;
TEXTURES;
TWINNING;
X RAY DIFFRACTION;
COPPER ELECTRODEPOSITS;
CRYSTALLITES;
RESISTIVITY;
SELF-ANNEALING;
ELECTROPLATING;
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EID: 33744909559
PISSN: 13596462
EISSN: None
Source Type: Journal
DOI: 10.1016/j.scriptamat.2006.05.010 Document Type: Article |
Times cited : (34)
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References (15)
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