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Volumn 352, Issue 9-20 SPEC. ISS., 2006, Pages 896-900

Toward the fast deposition of highly crystallized microcrystalline silicon films with low defect density for Si thin-film solar cells

(4) Jia, Haijun a Saha, Jhantu K a Ohse, Naoyuki a Shirai, Hajime a

a SAITAMA UNIVERSITY (Japan)

Author keywords

Chemical vapor deposition; Conductivity; Crystal growth; Electron spin resonance; Ellipsometry; Microcrystallinity; Optical spectroscopy; Photoconductivity; Plasma deposition; Raman scattering; Raman spectroscopy; Silicon; Solar cells; X ray diffraction

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTALLIZATION; ELECTRIC CONDUCTIVITY; ELLIPSOMETRY; PARAMAGNETIC RESONANCE; PHOTOCONDUCTIVITY; PLASMAS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SOLAR CELLS; THIN FILMS; X RAY DIFFRACTION;

MICROCRYSTALLINITY; OPTICAL SPECTROSCOPY; PLASMA DEPOSITION; PLASMA PARAMETERS;

SEMICONDUCTING SILICON;

EID: 33744526336 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2005.12.032 Document Type: Article

Times cited : (9)

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