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Volumn 45, Issue 5 A, 2006, Pages 4006-4008
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Hole confinement and 1/f noise characteristics of SiGe double-quantum-well p-Type metal-oxide-semiconductor field-effect transistors
a b a c d,e |
Author keywords
Carrier confinement; Double quantum wells; Gate voltage swings
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Indexed keywords
DEGRADATION;
INTERFACES (MATERIALS);
SEMICONDUCTING SILICON COMPOUNDS;
SEMICONDUCTOR QUANTUM WELLS;
SILICON;
TRANSCONDUCTANCE;
CARRIER CONFINEMENT;
DOUBLE QUANTUM WELLS;
GATE VOLTAGE SWINGS;
MOSFET DEVICES;
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EID: 33646855601
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.45.4006 Document Type: Article |
Times cited : (2)
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References (9)
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