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Volumn 45, Issue 5 A, 2006, Pages 4006-4008

Hole confinement and 1/f noise characteristics of SiGe double-quantum-well p-Type metal-oxide-semiconductor field-effect transistors

Author keywords

Carrier confinement; Double quantum wells; Gate voltage swings

Indexed keywords

DEGRADATION; INTERFACES (MATERIALS); SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR QUANTUM WELLS; SILICON; TRANSCONDUCTANCE;

EID: 33646855601     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.4006     Document Type: Article
Times cited : (2)

References (9)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.