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Volumn 6127, Issue , 2006, Pages

Development of device fabrication process for strained layer superlattice IR detectors

Author keywords

Ellipsometry; Etching; Fabrication process; InAs GaSb; Strained layer superlattice

Indexed keywords

ELLIPSOMETRY; ETCHING; PASSIVATION; SEMICONDUCTING GALLIUM COMPOUNDS; SEMICONDUCTING INDIUM COMPOUNDS; SEMICONDUCTOR SUPERLATTICES;

EID: 33646819691     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.640084     Document Type: Conference Paper
Times cited : (3)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.