Alicyclic photoresists for CO2-based next-generation microlithography: A tribute to James E. McGrath

Polymer

Volumn 47, Issue 11, 2006, Pages 4012-4017

  Boggiano, Mary Kate ^a   Vellenga, David ^c   Carbonell, Ruben ^c   Ashby, Valerie Sheares ^a   DeSimone, Joseph M ^a,b,c  

^a University of North Carolina at Chapel Hill   (United States)

^b UNIVERSITY OF NORTH CAROLINA SCHOOL OF MEDICINE   (United States)

^c North Carolina State University   (United States)

Author keywords

Addition polymerization; Condensed CO2; Photoresist synthesis

Indexed keywords

ADDITION REACTIONS; CARBON DIOXIDE; SOLVENTS; THERMODYNAMIC STABILITY;

ADDITION POLYMERIZATION; CONDENSED CO2; ETCH RESISTANCE; PHOTORESIST SYNTHESIS;

LITHOGRAPHY;

CARBON DIOXIDE; FABRICATION; MONOMER; POLYMERIZATION; SOLUBILITY; SOLVENT; SYNTHESIS; THERMAL STABILITY;

EID: 33646774000     PISSN: 00323861     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.polymer.2006.03.001     Document Type: Article

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