Progress towards the development of a 157 nm photoresist for carbon dioxide-based lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5039 II, Issue , 2003, Pages 1327-1332

  Zannoni, Luke A ^a   Simhan, Jay ^a   DeSimone, Joseph M ^a,b  

^a University of North Carolina at Chapel Hill   (United States)

^b North Carolina State University   (United States)

Author keywords

157 nm; Carbon dioxide; Photoresists; Tetrafluoroethylene

Indexed keywords

NANOTECHNOLOGY; ORGANIC SOLVENTS; SPIN COATING; SURFACE TENSION; VISCOSITY;

AMORPHOUS FLUOROPOLYMERS; CARBON DIOXIDE BASED LITHOGRAPHY; TETRAFLUOROETHYLENE;

PHOTORESISTS;

EID: 0141610908     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.483718     Document Type: Conference Paper

References (8)

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