Room temperature air oxidation of nanostructured Si thin films with varying porosities as studied by x-ray photoelectron spectroscopy

Journal of Applied Physics

Volumn 99, Issue 8, 2006, Pages

  Yang, D Q ^a   Meunier, M ^a   Sacher, E ^a  

^a ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

AIR; EXCIMER LASERS; NANOSTRUCTURED MATERIALS; OXIDATION; PHOTOEMISSION; POROSITY; TEMPERATURE DISTRIBUTION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

AIR OXIDATION; ROOM TEMPERATURE; SPECTRAL RATIOS; TIME-POROSITY SUPERPOSITION;

SILICON;

EID: 33646730887     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2193168     Document Type: Article

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