Nanometer-sized silicon crystallites prepared by excimer laser ablation in constant pressure inert gas

Applied Physics Letters

Volumn 68, Issue 13, 1996, Pages 1772-1774

  Yoshida, Takehito ^a   Takeyama, Shigeru ^a   Yamada, Yuka ^a   Mutoh, Katsuhiko ^a  

^a Matsushita Research Institute Tokyo Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EXCIMER LASERS; HELIUM; LASER ABLATION; MATHEMATICAL MODELS; NANOSTRUCTURED MATERIALS; PARTICLE SIZE ANALYSIS; PRESSURE EFFECTS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY; VISCOSITY;

CONSTANT PRESSURE GAS EVAPORATION; CRYSTALLINITY; CRYSTALLITES; INERTIA FLUID MODEL; PARTICLE SIZE DISTRIBUTION; ULTRAFINE PARTICLES;

SEMICONDUCTING SILICON;

EID: 0030106524     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116662     Document Type: Article

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