Optical properties of silicon nanocrystallites prepared by excimer laser ablation in inert gas

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 2 SUPPL. B, 1996, Pages 1361-1365

  Yamada, Yuka ^a   Orii, Takaaki ^b   Umezu, Ikurou ^c   Takeyama, Shigeru ^a   Yoshida, Takehito ^a  

^a Matsushita Research Institute Tokyo Inc   (Japan)

^b UNIVERSITY OF TSUKUBA   (Japan)

^c TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Laser ablation; Nanocrystallites; Oxidation; Photoluminescence; Silicon

Indexed keywords

EXCIMER LASERS; INERT GASES; IRRADIATION; LASER ABLATION; LENSES; MIRRORS; OPTICAL PROPERTIES; OXIDATION; PARTICLE SIZE ANALYSIS; PHOTOLUMINESCENCE; SEMICONDUCTING SILICON; SUBSTRATES;

DIFFERENTIAL EVACUATION SYSTEM; EXCIMER LASER ABLATION; EXCITATION LIGHT IRRADIATION; QUANTUM CONFINEMENT EFFECT; SILICON NANOCRYSTALLITES; TURBOMOLECULAR PUMP;

NANOSTRUCTURED MATERIALS;

EID: 0030080397     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.1361     Document Type: Article

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