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Volumn 38, Issue 4, 2006, Pages 502-505

Temperature dependence of band alignments in ultrathin Hf-A1-O and Al 2O3 films on p-Si (100)

Author keywords

Band gap; Band offset; High k dielectric; REELS; Thermal stability; XPS

Indexed keywords

ANNEALING; ELECTRONS; THERMAL EFFECTS; THIN FILMS; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

BAND GAP; BAND OFFSET; HIGH-K DIELECTRIC; REFLECTION ELECTRON ENERGY LOSS SPECTROSCOPY (REELS);

BAND STRUCTURE;

EID: 33646594752 PISSN: 01422421 EISSN: 10969918 Source Type: Journal
DOI: 10.1002/sia.2203 Document Type: Conference Paper

Times cited : (15)

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