Photocatalytic characteristics of hydro-oxygenated amorphous titanium oxide films prepared using remote plasma enhanced chemical vapor deposition

Applied Surface Science

Volumn 244, Issue 1-4, 2005, Pages 554-557

  Hatanaka, Y ^a   Naito, H ^b   Itou, S ^c   Kando, M ^b  

^a AICHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b SHIZUOKA UNIVERSITY   (Japan)

^c GIFU SHOTOKU GAKUEN UNIVERSITY   (Japan)

Author keywords

Amorphous semiconductor; Photocatalytic activity; Photoconductivity; Remote plasma enhanced CVD; TiO 2 film

Indexed keywords

AMORPHOUS MATERIALS; CATALYST ACTIVITY; METALLIC FILMS; PHOTOCATALYSIS; PHOTOCONDUCTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR MATERIALS; ULTRAVIOLET RADIATION; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS SEMICONDUCTORS; PHOTOCATALYTIC ACTIVITY; REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (RPE-CVD); TIO2 FILMS;

TITANIUM OXIDES;

EID: 15844374166     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2004.10.118     Document Type: Conference Paper

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