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Volumn 244, Issue 1-4, 2005, Pages 554-557
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Photocatalytic characteristics of hydro-oxygenated amorphous titanium oxide films prepared using remote plasma enhanced chemical vapor deposition
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Author keywords
Amorphous semiconductor; Photocatalytic activity; Photoconductivity; Remote plasma enhanced CVD; TiO 2 film
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Indexed keywords
AMORPHOUS MATERIALS;
CATALYST ACTIVITY;
METALLIC FILMS;
PHOTOCATALYSIS;
PHOTOCONDUCTIVITY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SEMICONDUCTOR MATERIALS;
ULTRAVIOLET RADIATION;
X RAY DIFFRACTION ANALYSIS;
AMORPHOUS SEMICONDUCTORS;
PHOTOCATALYTIC ACTIVITY;
REMOTE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (RPE-CVD);
TIO2 FILMS;
TITANIUM OXIDES;
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EID: 15844374166
PISSN: 01694332
EISSN: None
Source Type: Journal
DOI: 10.1016/j.apsusc.2004.10.118 Document Type: Conference Paper |
Times cited : (22)
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References (8)
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