Syntheses and optical properties of low-temperature SiOx and TiOx thin films prepared by plasma enhanced CVD

Vacuum

Volumn 51, Issue 4, 1998, Pages 525-530

  Song, Yizhou ^a   Sakurai, Takeshi ^a   Kishimoto, Koichi ^a   Maruta, Kazuhiko ^a   Matsumoto, Shigeharu ^a   Kikuchi, Kazuo ^a  

^a Shincron Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; INFRARED RADIATION; LIGHT EXTINCTION; MAGNETIC FIELD EFFECTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILANES; STOICHIOMETRY; SYNTHESIS (CHEMICAL); THIN FILMS; TITANIUM OXIDES;

ETHYLTRIMETHYLSILANE; EXTINCTION COEFFICIENT; SILICON OXIDE; TETRAETHOXYSILANE; TITANIUMTETRAISOPROPOXIDE;

DIELECTRIC FILMS;

EID: 0032319436     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00246-2     Document Type: Article

References (9)

1. Park, Y.-B., Kang, J.-K. and Rhee, S.-Woo., Thin Solid Films, 1996, 43, 280.
2. Deshmukh, S. C. and Aydil, E. S., J. Vac. Sci. Technol. A, 1995, 13, 2355.
3. Yen, J., Gilmer, D. C., Campbell, S. A., Gladfelter, W. L. and Schmid, P. G., J. Vac. Sci. Technol. B, 1996, 14, 1706.
4. Kim, D. S. and Lee, Y. H., Thin Solid Films, 1996, 283, 109.
5. Selamoglu, N., Mucha, J. A., Ibbotson, D. E. and Flamm, D. L., J. Vac. Sci. Technol. B, 1989, 7, 1345.
6. Deshmukh, S. C. and Aydil, E. S., J. Vac. Sci. Technol. B, 1996, 14, 739.
7. Aspnes, D. E., Am. J. Phys., 1982, 50, 704.
8. Aspnes, D. E., Thin Solid Films, 1982, 89, 249.
9. Pai, P. G., Chao, S. S., Takagi, Y. and Lucovsky, G., J. Vac. Sci. Technol. A, 1986, 4, 689.