Effect of microstructures on nanocrystallite nucleation and growth in hydrogenated amorphous indium-tin-oxide films

Journal of Applied Physics

Volumn 93, Issue 2, 2003, Pages 1032-1038

  Ando, Masahiko ^a   Nishimura, Etsuko ^a   Onisawa, Ken Ichi ^a   Minemura, Tetsuroh ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLIZATION; FILM PREPARATION; HYDROGENATION; INDIUM; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; NUCLEATION; SPUTTERING;

AMORPHOUS MATRIX;

AMORPHOUS FILMS;

EID: 0037439419     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1528298     Document Type: Article

References (10)

1. S. Ishibashi, Y. Higuchi, Y. Ota, and K. Nakamura, J. Vac. Sci. Technol. A 8, 1399 (1990).
2. M. Ando, M. Takabatake, E. Nishimura, F. Leblanc, K. Onisawa, and T. Minemura, Proceedings of the 16th International Conference on Amorphous Semiconductors, Kobe, Japan, 1995, p. 385.
3. E. Nishimura, M. Ando, K. Onisawa, M. Takabatake, and T. Minemura, Jpn. J. Appl. Phys., Part 1 35, 2788 (1996).
4. V. G. Karpov, Phys. Rev. B 50, 9124 (1994).
5. A. B. Pevtsov, V. Yu. Davydov, N. A. Feoktistov, and V. G. Karpov, Phys. Rev. B 52, 955 (1994).
6. S. Muranaka, Y. Bando, and T. Takada, Thin Solid Films 151, 355 (1987).
7. H. Koestlin, R. Jost, and W. Lems, Phys. Status Solidi A 29, 87 (1975).
8. J. R. Bellingham, W. A. Phillips, and C. J. Adkins, Thin Solid Films 195, 23 (1991).
9. M. Scholten and J. E. A. M. van den Meerakker, J. Electrochem. Soc. 140, 147 (1993).
10. Y. Shigesato and I. Yasui, J. Vac. Sci. Technol. A 13, 268 (1995).