Effects of O 2 and N 2 plasma treatment on 6FDA-BisAAF fluorine-contained polyimide

Journal of the Electrochemical Society

Volumn 153, Issue 6, 2006, Pages

  Yang, Ching Yu ^a   Chen, J S ^a,b   Hsu, Steve Lien Chung ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b ELECTROCHEMICAL SOCIETY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRICAL CHARACTERISTICS; FLUORINE-CONTAINED POLYIMIDE; METAL-INSULATOR-SILICON STRUCTURE; PLASMA TREATMENT;

ELECTRIC POTENTIAL; NITROGEN; OXYGEN; PLASMA APPLICATIONS; POLYIMIDES; X RAY PHOTOELECTRON SPECTROSCOPY;

FLUORINE CONTAINING POLYMERS;

EID: 33646423538     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2193402     Document Type: Article

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